Used for synthesizing 2D and other nanostructured  materials 

Used for regular electrical and optoelectrical characterizations

Used for  anisotropic etching of nanostructures

Used for optoelectrical measurements at low temperature

For  measurement PL of nanostructures samples

For making nanodevices

For  electrical and optoelectrical characterizations

Used for  making van der Waals heterostructures.

Used for electrical measurements under strain

For determining thickness of thin-films and measuring reflectance, absorbance and transmittance